| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To promote shortening of the measurement time and simplification of the device structure of an interference film thickness gauge 100 by enabling omission of an incidental measurement (especially measurement of a calibration sample), which has been conventionally required every time when a light reflectance of an inspection work is measured. <P>SOLUTION: The thickness gauge is so structured previously that an internal reflection mechanism 8 having a constant light reflectance is arranged inside a head 4, and that light reflected by the internal reflection mechanism 8 is received by a photodetector 2. The light reflectance of the inspection work is calculated, on the basis of an output value of the photodetector 2 in a state that light is not substantially guided in, an output value of the photodetector 2 acquired when a dark sample that does not substantially reflect light is used, an output value of the photodetector 2 acquired when a calibration sample having a known light reflectance is used, and an output value of the photodetector 2 acquired when the inspection work being a measuring object is used. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
