| 摘要 |
<p>PURPOSE: An apparatus and method for processing a substrate are provided to efficiently supply and exchange a mask required for a process by including a mask stoker in a processing chamber. CONSTITUTION: A main chamber(10) includes a plurality of opening parts on a sidewall thereof. A substrate is moved by a rotation of a moving chamber(20). Processing chambers(51-59) perform preset processes for substrates supplied through the moving chamber. A mask stoker(MS) is formed outside the processing chamber. A gate valve(G1,G2) is located between the processing chamber and the mask stoker.</p> |
