发明名称 INTEGRATED PROCESS CONDITION SENSING WAFER AND DATA ANALYSIS SYSTEM
摘要 A process condition measuring device and a handling system may be highly integrated with a production environment where the dimensions of the process condition measuring device are close to those of a production substrate and the handling system is similar to a substrate carrier used for production substrates. Process conditions may be measured with little disturbance to the production environment. Data may be transferred from a process condition-measuring device to a user with little or no human intervention.
申请公布号 KR101155882(B1) 申请公布日期 2012.07.06
申请号 KR20067022545 申请日期 2005.04.29
申请人 发明人
分类号 H01L21/66;H01L21/00 主分类号 H01L21/66
代理机构 代理人
主权项
地址