| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate with a multilayer reflective film exhibiting a high reflectance only with a material constituting the multilayer reflective film, and to provide a method for manufacturing a reflective mask blank, and a method for manufacturing a reflective mask.SOLUTION: A method for manufacturing a substrate with a multilayer reflective film of the present invention is used to manufacture a substrate with a multilayer reflection film having a multilayer reflection film (2) of a structure in which a first layer (21) and a second layer (22) are alternately laminated on a substrate (1). The substrate (1) is a glass substrate, the first layer (21) is composed of a material containing Si or an Si compound. The first layer (21) is formed by normal incidence film formation where the scattering particles from an Si target are made incident on the surface of the substrate (1) substantially in the vertical direction. The second layer (22) is formed by oblique incidence film formation where the scattering particles from a spattering target for forming the second layer (22) are made incident on the surface of the substrate (1) at an angle of 40-90 degrees with respect to the direction perpendicular thereto. |
