APPARATUS FOR DISPENSING PHOTORESIST

摘要

An apparatus for spraying a process solution may include a spraying nozzle which has an injection part which injects a process solution for spraying the process solution to a substrate; and a priming unit for making uniform the process solution injected from the injection part and a cleansing bath which receives the cleaning solution of the priming unit; a priming roller which has an outer surface where the process solution injected from the injection part is attached and has a part which is dipped in the cleaning solution; and a brush which has an outer surface of the priming roller to touch the injection part of the spraying nozzle to supply the cleaning solution to the injection part of the spraying nozzle.