| 发明名称 |
VAPOR DEPOSITION APPARATUS |
| 摘要 |
A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit. |
| 申请公布号 |
US2015027371(A1) |
申请公布日期 |
2015.01.29 |
| 申请号 |
US201414161984 |
申请日期 |
2014.01.23 |
| 申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
Kim Jin-Kwang;Song Seung-Yong;Huh Myung-Soo;Jung Suk-Won;Jang Choel-Min;Kim Jae-Hyun;Kim Sung-Chul |
| 分类号 |
C23C16/455 |
主分类号 |
C23C16/455 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A vapor deposition apparatus which provides a deposition film on a substrate, the vapor deposition apparatus comprising:
a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit. |
| 地址 |
Yongin-City KR |
