| 发明名称 |
METHOD FOR MEASURING THICKNESS OF OBJECT |
| 摘要 |
Methods for measuring a thickness of an object including acquiring at least one of a wavelength domain spectrum for an amplitude ratio (Ψ) and a phase difference (Δ) of reflected light from a film material, converting the wavelength domain spectrum into a 1/wavelength domain spectrum, acquiring a resulting spectrum by performing fast fourier transform (FFT) on the 1/wavelength domain spectrum, and measuring a thickness of the film material from the resulting spectrum may be provided. |
| 申请公布号 |
US2015029517(A1) |
申请公布日期 |
2015.01.29 |
| 申请号 |
US201414286213 |
申请日期 |
2014.05.23 |
| 申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
PARK Jang-Ik;NAM Il-Hwan;RYU Kwan-Woo |
| 分类号 |
G01B11/06 |
主分类号 |
G01B11/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for measuring a thickness of an object, the method comprising:
acquiring a wavelength domain spectrum for at least one of an amplitude ratio (Ψ) and a phase difference (Δ) of reflected light from a film material; converting the wavelength domain spectrum into a 1/wavelength domain spectrum; acquiring a resulting spectrum by performing fast fourier transform (FFT) on the 1/wavelength domain spectrum; and measuring a thickness of the film material from the resulting spectrum. |
| 地址 |
Suwon-Si KR |
