发明名称 NORMAL PRESSURE VAPOR GROWTH DEVICE OR PIPING OF NORMAL PRESSURE VAPOR GROWTH DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a normal pressure vapor growth device or piping thereof including, at low cost, a highly-reliable interlock function that can restore pressure in a reaction vessel to normal pressure when an abnormality occurs in the pressure of the reaction vessel.SOLUTION: A normal pressure vapor growth device includes a pressure adjustment line 4b on the way of gas in a reaction vessel 2 reaching a discharge valve 5 that, when an interlock function operates, allows the gas to be discharged from the reaction vessel 2 or allows a nitrogen gas for adjusting pressure in the reaction vessel 2 to flow into the reaction vessel, so as to adjust pressure in the reaction vessel 2. The pressure adjustment line 4b has a zone z where a plurality of ducts into which the line has branched are joined. Each of the ducts is provided with: a first check valve 9 arranged so that the outflow direction of the gas is a forward direction; or a second check valve 10 arranged so that the inflow direction of the nitrogen gas is a forward direction. In the entire of the plurality of ducts, the first and second check valves 9 and 10 are arranged.
申请公布号 JP2015146409(A) 申请公布日期 2015.08.13
申请号 JP20140019375 申请日期 2014.02.04
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 YAGI SHINICHIRO
分类号 H01L21/205;C23C16/52;C30B25/14 主分类号 H01L21/205
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