发明名称 POLYAMIC ACID SOLUTION
摘要 <p>The present invention relates to a polyamic acid solution and a display device and, more specifically, to a polyamic acid solution which can be used for a base layer or a protective layer of a display device, and to a display device including a film formed by the imidization of the polyamic acid solution. The polyamic acid solution has excellent thermal properties such as a low rate of thermal expansion and a high pyrolysis temperature, and can thus be applied to a base layer or a protective layer of the display device.</p>
申请公布号 KR20150108812(A) 申请公布日期 2015.09.30
申请号 KR20150129425 申请日期 2015.09.14
申请人 KOLON INDUSTRIES, INC. 发明人 HONG, KI IL;MIN, WOONG KI
分类号 C08L79/08;C08G73/10;C09D179/08;G02F1/1335 主分类号 C08L79/08
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