PROCESS FOR TREATMENT BY A BEAM OF MONO- OR MULTICHARGED IONS OF A GAS TO PRODUCE ANTIREFLECTIVE GLASS MATERIALS

摘要

A method of treatment using a beam of singly- and multiply-charged gas ions produced by an electron cyclotron resonance (ECR) source of a glass material in which - the ion acceleration voltage of between 5 kV and 1000 kV is chosen to create an implanted layer of a thickness equal to a multiple of 100 nm; - the ion dose per surface unit in a range of between 1012 ions/cm2 and 1018 ions/cm2 is chosen so as to create an atomic concentration of ions equal to 10 pcnt with a level of uncertainty of (+/-)5 pcnt . Advantageously this makes it possible to obtain materials made from glass that is non-reflective in the visible range.