发明名称 セラミックス円筒形スパッタリングターゲット材およびその製造方法
摘要 PROBLEM TO BE SOLVED: To provide a ceramic cylindrical sputtering target material having a high density and a long length.SOLUTION: A ceramic cylindrical sputtering target material according to the present invention has a length of 500 mm or more and a relative density of 95% or more, and is formed in a one-piece product. Since the ceramic cylindrical sputtering target material is a high-density, one-piece product with a length of 500 mm or more, it eliminates the need to stack a large number of sputtering target materials into a long size. Therefore, in a case of using the ceramic cylindrical sputtering target material of the present invention in a magnetron rotary cathode sputtering apparatus or the like, division parts do not exist in the entire target material or the number of the division parts is small, so occurrence of arcing or particles is low during sputtering.
申请公布号 JP5784849(B2) 申请公布日期 2015.09.24
申请号 JP20150009496 申请日期 2015.01.21
申请人 三井金属鉱業株式会社 发明人 眞▲崎▼ 貴則;石田 新太郎
分类号 C04B35/632;C04B35/00;C04B35/453;C23C14/34 主分类号 C04B35/632
代理机构 代理人
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