| 发明名称 |
ION BEAM UNIFORMITY CONTROL USING ION BEAM BLOCKERS |
| 摘要 |
A method of achieving ion beam uniformity control using ion beam blockers. The method includes generating an ion beam, detecting a current profile of said ion beam with an ion beam blocker unit, wherein said detected current profile is an initial current profile, blocking a portion of said ion beam with said ion beam blocker unit to achieve a second current profile that is different from the initial current profile, and implanting said ion beam into a workpiece after said blocking. |
| 申请公布号 |
US2015270099(A1) |
申请公布日期 |
2015.09.24 |
| 申请号 |
US201414221840 |
申请日期 |
2014.03.21 |
| 申请人 |
Varian Semiconductor Equipment Associates, Inc. |
发明人 |
Olson Joseph C. |
| 分类号 |
H01J37/30;H01J37/317 |
主分类号 |
H01J37/30 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of achieving ion beam uniformity control comprising:
generating an ion beam; detecting a current profile of said ion beam with an ion beam blocker unit, wherein said detected current profile is an initial current profile; blocking a portion of said ion beam with said ion beam blocker unit to achieve a second current profile that is different from the initial current profile; and implanting said ion beam into a workpiece after said blocking. |
| 地址 |
Gloucester MA US |
