CONTROL APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING SYSTEM

摘要

The present invention has a purpose of providing a control apparatus optimizing frequency of putting in monitor wafers. The control apparatus controls a substrate processing apparatus arranging at least a monitor substrate. The control apparatus controls a substrate processing apparatus to optimize the frequency of putting in a monitor substrate based on a difference between the predicted result and the processing result of the monitor substrate processed by the substrate processing apparatus.