| 发明名称 | Mask | ||
| 摘要 | A light irradiation apparatus and a method of manufacture a photo-aligning layer are disclosed. A mask included in a light irradiation apparatus according to one embodiment is configured to irradiate the light having straightness at a high level of illumination to a subject that is apart from the mask with a certain distance. A photo-aligning layer with a desired alignment pattern can be fabricated using the mask. | ||
| 申请公布号 | US9140979(B2) | 申请公布日期 | 2015.09.22 |
| 申请号 | US201213356463 | 申请日期 | 2012.01.23 |
| 申请人 | LG CHEM, LTD. | 发明人 | Kim Sin Young;Hong Kyung Ki;Yoon Hyuk;Ju Won Cheul;Cho Yong Il;Park Moon Soo;Ko Dong Ho;Ryu Su Young |
| 分类号 | G03F1/00;G03F1/52;G03F1/50 | 主分类号 | G03F1/00 |
| 代理机构 | Dentons US LLP | 代理人 | Dentons US LLP |
| 主权项 | 1. An apparatus comprising: a device to which a subject is mounted; and a mask including at least one opening to guide a light to the subject, wherein a size of the opening is adjusted according to a distance between the mask and the subject, wherein surfaces of the mask and the subject facing each other are curved surfaces, and wherein the opening satisfies the following relationship: 5×the distance between the mask and the subject≦the shortest distance through which light may pass through the opening. | ||
| 地址 | Seoul KR | ||