| 发明名称 |
A LAYOUT METHOD OF A SEMICONDUCTOR DEVICE, PHOTOMASK AND THE DEVICE FORMED BY USING THE METHOD |
| 摘要 |
The present invention provides a layout method of a semiconductor device and the semiconductor device manufactured by using the same. In the method, auxiliary patterns are arranged on a main pattern for a gate electrode of the outermost active region which is predicted to be widely formed in a real manufacturing process. |
| 申请公布号 |
KR20150106223(A) |
申请公布日期 |
2015.09.21 |
| 申请号 |
KR20140028462 |
申请日期 |
2014.03.11 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, HUN KOOK;KIM, HONG SOO;LEE, JU YEON |
| 分类号 |
H01L21/336;H01L21/027 |
主分类号 |
H01L21/336 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
