发明名称 ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 An illumination optical apparatus guides exposure light emitted from an exposure light source, to an illumination target object. The illumination optical apparatus has a plurality of spatial light modulation members arranged in an array form, and each spatial light modulation member is so configured that a plurality of reflecting optical elements each including a movable reflecting surface are arranged in an array form. At least one of the spatial light modulation members is arranged in an optical path of the light emitted from the light source.
申请公布号 US2015261096(A1) 申请公布日期 2015.09.17
申请号 US201514716168 申请日期 2015.05.19
申请人 NIKON CORPORATION 发明人 HIROTA Hiroyuki
分类号 G03F7/20;G02B26/02 主分类号 G03F7/20
代理机构 代理人
主权项 1. An illumination optical system adapted to be used in an exposure apparatus for illuminating a pattern with exposure light to expose a substrate against the exposure light through the pattern, which illuminates the pattern with the exposure light from a light source, the illumination optical system comprising: a division element having a plurality of division regions arranged in an optical path of the illumination light, the division element superposedly illuminating an illumination region with a plurality of light beams from the plurality of the division regions; a spatial light modulator arranged in the illumination region and having a plurality of movable mirrors; and a distribution forming optical system which condenses light from the spatial light modulator and forms a predetermined light intensity distribution in an illumination pupil of the illumination optical system.
地址 Tokyo JP