发明名称 |
Semiconductor Device Having a Charge Compensation Region |
摘要 |
A semiconductor device includes a semiconductor material of a first conductivity type, a body region of a second (opposite) conductivity type extending into the semiconductor material from a main surface of the semiconductor material, a source region of the first conductivity type disposed in the body region, and a channel region extending laterally in the body region from the source region along the main surface. A charge compensation region of the second conductivity type can be provided under the body region which extends in a direction parallel to the main surface and terminates prior to a pn-junction between the source and body regions at the main surface, and/or an additional region of the first conductivity type which has at least one peak doping concentration each of which occurs deeper in the semiconductor material from the main surface than a peak doping concentration of the device channel region. |
申请公布号 |
US2015263165(A1) |
申请公布日期 |
2015.09.17 |
申请号 |
US201514727420 |
申请日期 |
2015.06.01 |
申请人 |
Infineon Technologies AG |
发明人 |
Finney Adrian;Wood Andrew |
分类号 |
H01L29/78;H01L21/266;H01L29/66;H01L21/324;H01L29/10;H01L29/08;H01L21/306;H01L21/308;H01L21/265;H01L29/06 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
|
主权项 |
1. A semiconductor device, comprising:
a semiconductor material of a first conductivity type having a main surface; a body region of a second conductivity type opposite the first conductivity type extending into the semiconductor material from the main surface; a source region of the first conductivity type disposed in the body region; a channel region extending in the body region from the source region along the main surface of the semiconductor material; a charge compensation region of the second conductivity type disposed under the body region; and an additional region of the first conductivity type disposed in the semiconductor material adjacent the body region, the additional region having a peak doping concentration which occurs deeper in the semiconductor material from the main surface than a peak doping concentration of the channel region. |
地址 |
Neubiberg DE |