THIN FILM DEPOSITING APPARATUS

摘要

An apparatus for forming a thin film is disclosed. According to the present invention, the apparatus for forming a thin film comprises: a chamber where a substrate is disposed; a vacuum means which changes the inside of the chamber into a vacuum state; a gas supply means supplying an inert gas to the inside of the vacuum chamber; and a magnetron unit connected with the chamber and supplying carbon plasma to the chamber to form a diamond-shaped carbon thin film on the substrate.