Illumination system, lithographic apparatus and method of forming an illumination mode

摘要

An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.

主权项

1. An illumination system having a plurality of reflective elements, the reflective elements being movable between different orientations which direct radiation towards different locations in a pupil plane, thereby forming different illumination modes, wherein each reflective element is moveable between
a respective first orientation which directs radiation towards a first associated location at the pupil plane, and a respective second orientation which directs radiation towards a second associated location at the pupil plane, the respective first orientation and the respective second orientation of the reflective element being defined by end stops, wherein the end stops have adjustable positions.