Head cleaning method and liquid discharging apparatus

摘要

In a liquid discharging apparatus that includes a circulation flow path, a head cleaning method includes a first process in which a flow rate of the liquid flowing through the circulation flow path per unit time is set at a first flow rate; a second process in which, after the first process is completed, a wiping unit carries out a wiping operation in a state where the liquid is discharged from the nozzle; a third process in which, after the second process is completed, the wiping unit carries out the wiping operation in a state where the liquid is not discharged from the nozzle; and a fourth process in which, after the third process is completed, a flow rate of the liquid flowing through the circulation flow path per unit time is set at a second flow rate that is lower than the first flow rate.

主权项

1. A head cleaning method in a liquid discharging apparatus that includes a circulation flow path having a head at which a nozzle is provided to discharge liquid onto a recording medium, a storage unit that stores the liquid, a first flow path through which the liquid is supplied from the storage unit to the head, and a second flow path through which the liquid flows back to the storage unit from the head; a pump that circulates the liquid through the circulation flow path; and a wiping unit that moves relative to the head in a state where the wiping unit is in contact with a nozzle opening surface of the head and thus, carries out a wiping operation in which foreign matter adhering to the nozzle opening surface is wiped off, the head cleaning method comprising:
a first process of setting a flow rate of the liquid flowing through the circulation flow path per unit time at a first flow rate; a second process of carrying out the wiping operation by the wiping unit in a state where the liquid is discharged from the nozzle after the first process is completed; a third process of carrying out the wiping operation by the wiping unit in a state where the liquid is not discharged from the nozzle after the second process is completed, wherein the wiping process performed in the second process and the third process is performed while the liquid flowing through the circulation path at the first flow rate provides pressure to the head; and a fourth process of setting a flow rate of the liquid flowing through the circulation flow path per unit time at a second flow rate that is lower than the first flow rate after the third process is completed.