发明名称 Semiconductor package having a metal member and a resin mold, which are bonded to a silane coupling agent and an intermediate layer of an oxide film
摘要 Reliability is improved by improving adhesiveness, crack resistance, and moisture resistance of a metal member-resin jointed body by enhancing adhesiveness between the metal member and the resin.;A jointed body of a metal member and a resin including: an intermediate layer and a silane coupling agent layer formed on the metal member at an interface between the metal member and the resin, wherein the silane coupling agent layer and the resin are contacted; the intermediate layer is any one of an oxide layer of the metal, a chelating agent layer, a composite layer made of the oxide layer and the chelating agent layer, and a mixed layer made of the oxide and the chelating agent; and the intermediate layer has an electrically non-insulating characteristic, and a method of manufacturing the same.
申请公布号 US9136244(B2) 申请公布日期 2015.09.15
申请号 US201213720357 申请日期 2012.12.19
申请人 Hitachi, Ltd. 发明人 Mabuchi Katsumi;Akahoshi Haruo;Motowaki Shigehisa
分类号 H01L23/495;H01L23/22;H01L23/24;H01L23/48;H01L23/52;H01L23/00;H01B1/00;H01L23/31 主分类号 H01L23/495
代理机构 Volpe and Koenig, P.C. 代理人 Volpe and Koenig, P.C.
主权项 1. A jointed body of a metal member and a resin comprising an intermediate layer and a silane coupling agent layer formed on the metal member at an interface between the metal member and the resin, wherein the silane coupling agent layer and the resin are contacted, the intermediate layer is any one of an oxide layer of the metal, a chelating agent layer, a composite layer made of the oxide layer and the chelating agent layer, and a mixed layer made of the oxide and the chelating agent, and the intermediate layer has an electrically non-insulating characteristic, wherein the silane coupling agent is represented by a structure of X3-nRnSi—Y or X3-nSiR′SiX3-n, where n is 0 or 1; X is selected from a group consisting of a hydrolyzable group OR (R is represented by methyl, ethyl, ethylmethyl, propyl, butyl, isobutyl, s-butyl, t-butyl, and acetyl); X may be the same as or different from each other; Y is selected from a group consisting of organic functional groups represented by amino, mercapto, phenyl, vinyl, epoxy, methacryl, isocyanate, ureide, and sulfur or an alkyl group; R is a methyl group; and R′ is one or more groups selected from a group consisting of alkyl, alkenyl, and alkenyl substituted by at least one amino group or S group.
地址 Tokyo JP