发明名称 PHOTOMASK-FORMING GLASS SUBSTRATE AND MAKING METHOD
摘要 A PHOTOMASK-FORMING GLASS SUBSTRATE HAVING A SQUARE MAJOR SURFACE IS PROVIDED WHEREIN TWO STRIP REGIONS ARE DEFINED ON THE MAJOR SURFACE NEAR A PAIR OF OPPOSED SIDES SUCH THAT EACH REGION SPANS BETWEEN 2 MM AND 10 MM INWARD OF THE SIDE AND EXCLUDES END PORTIONS EXTENDING 2 MM INWARD FROM THE OPPOSED ENDS OF THE SIDE, A LEAST SQUARE PLANE IS COMPUTED FOR EACH OF THE TWO STRIP REGIONS, THE ANGLE INCLUDED BETWEEN NORMAL LINES TO THE LEAST SQUARES PLANES OF TWO STRIP REGIONS IS WITHIN 10 SECONDS, AND THE HEIGHT DIFFERENCE BETWEEN TWO STRIP REGIONS IS UP TO 0.5 ?M. THE MOST ILLUSTRATIVE DRAWING IS
申请公布号 MY155168(A) 申请公布日期 2015.09.15
申请号 MY2010PI05727 申请日期 2010.12.02
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 DAIJITSU HARADA;MAMORU MORIKAWA;MASAKI TAKEUCHI;YUKIO SHIBANO
分类号 G03F1/60;C03C15/00;C03C19/00 主分类号 G03F1/60
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