发明名称 METHOD AND APPARATUS FOR MONITORING SURFACE PHENOMENA
摘要 A method for monitoring surface phenomena comprises: - measuring a first surface plasmon resonance angle value (ϕSPR,REF) of a sample region (REG1), - measuring a first critical angle value (ϕTIR,REF) of the sample region (REG1), - causing a change of surface concentration (cM1,SRF) of an analyte (M1) at the sample region (REG1), - changing the bulk composition at the sample region (REG1), - measuring a second surface plasmon resonance angle value (ϕSPR(t)) of the sample region (REG1), - measuring a second critical angle value (ϕTIR(t)) of the sample region (REG1), and - determining an indicator value (ϕAUX(t)) indicative of the change of the surface concentration (cM1,SRF), wherein the indicator value (ϕAUX(t)) is determined from the second surface plasmon resonance angle value (ϕSPR(t)) by compensating an effect of the bulk composition, and wherein the magnitude (ϕCOMP) of said effect is determined by using the second critical angle value (ϕTIR(t)).
申请公布号 WO2015132456(A1) 申请公布日期 2015.09.11
申请号 WO2015FI50095 申请日期 2015.02.18
申请人 BIONAVIS OY 发明人 SADOWSKI, JANUSZ;GRANQVIST, NIKO;TUPPURAINEN, JUSSI;JOKINEN, ANNIKA
分类号 G01N21/552 主分类号 G01N21/552
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