发明名称 HIGHLY ABSORBING LAYER SYSTEM, METHOD FOR PRODUCING THE LAYER SYSTEM AND SUITABLE SPUTTERING TARGET THEREFOR
摘要 <p>The invention relates to a light absorbing layer system consisting of at least two layers, one of which is an anti-reflective layer which faces an observer and which is made from a dielectric material, and at least one other layer is an absorbing layer facing away from the observer and is made from an oxide or from an oxynitride having a sub-stoichiometric oxygen content. Said layer system has a wavelength range of between 380 - 780nm including a visual transmission Tv of less than 1% and a visual reflection Rv of less than 6% and is characterised by a kappa absorption index of at least 0.70 with a wavelength of 550 mn.</p>
申请公布号 EP2912500(A2) 申请公布日期 2015.09.02
申请号 EP20130788694 申请日期 2013.10.15
申请人 HERAEUS DEUTSCHLAND GMBH & CO. KG;FRAUNHOFER GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. 发明人 SCHLOTT, MARTIN;KASTNER, ALBERT;SCHULTHEIS, MARKUS;WAGNER, JENS;SCHNEIDER-BETZ, SABINE;DEWALD, WILMA;SZYSZKA, BERND;SITTINGER, VOLKER
分类号 G02B1/11;G02B5/22 主分类号 G02B1/11
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