Method of loading a substrate on a substrate table and lithographic apparatus and device manufacturing method

摘要

The invention relates to a method of loading a first object on a second object in a lithographic apparatus. The method includes: a) loading the first object on the second object, b) waiting a predetermined time interval and c) performing a relaxation action. The first object may be a substrate and the second object a substrate table. The first object may also be a substrate table and the second object a support structure, supporting the substrate table.

主权项

1. A method comprising:
loading a first object onto a second object; waiting an amount of time; and performing a relaxation action comprising:
supplying a gas in between the first object and the second object; andlifting the first object from the second object.