Layout modification method and system

摘要

A method comprises providing a non-transitory, machine-readable storage medium storing a partial netlist of at least a portion of a previously taped-out integrated circuit (IC) layout, representing a set of photomasks for fabricating an IC having the IC layout such that the IC meets a first specification value. A computer identifies a proper subset of a plurality of first devices in the IC layout, such that replacement of the proper subset of the first devices by second devices in a revised IC layout satisfies a second specification value different from the first specification value. At least one layout mask is generated and stored in at least one non-transitory machine readable storage medium, accessible by a tool for forming at least one additional photomask, such that the set of photomasks and the at least one additional photomask are usable to fabricate an IC according to the revised IC layout.

主权项

1. A method comprising:
identifying a plurality of first standard cells having first devices within a description of a part of a layout of an integrated circuit (IC) that satisfies a first specification value, wherein the IC is patterned using a set of masks; identifying timing paths that connect respective groups of first standard cells within the plurality of standard cells; selecting a subset of the timing paths including a subset of the plurality of first standard cells; and generating data for forming an additional mask, wherein a modified IC that satisfies a second specification value is to be patterned using the set of masks and the additional mask, and the additional mask changes a process step performed using one of the set of masks to form the second devices in place of the first devices in the subset of the plurality of first standard cells, wherein a computer is used to perform at least one of the steps of identifying a plurality of first standard cells, identifying timing paths, selecting or generating.