DEPOSITION SYSTEM

摘要

A deposition system comprises: a plurality of process chamber groups arranged in a first direction; a carrier to transmit the process chamber groups; at least one gate valve disposed between the process chamber groups to supply a transmitting path of the carrier between the process chamber groups; a substrate which is attached to the carrier, and on which a deposition material is deposited; and a plurality of attractive levitation modules disposed to face the carrier inside the process chamber groups to transmit the carrier with an electromagnetic force. A sum total of the electromagnetic force of the attractive levitation modules overlapped with the carrier when a predetermined area of the carrier overlaps with a discontinuous section defined as an area in which a gate valve is disposed, is set more largely than a sum total of the electromagnetic force of the attractive levitation modules overlapped with the carrier when the carrier is disposed inside each of the process chamber groups.