| 摘要 |
The method involves scanning surfaces of inclined sides (202, 203) of a characterization structure (200) by a tip (205). Lateral distance parallel to a plane of a surface of a substrate in the structure is measured for given heights (h1, h2, h3) of the structure by integrating convolution of shape of edges of the tip with shape of the structure, where the distance separates the inclined sides. Characteristic dimension (D) of the tip is determined based on the measured lateral distance and actual lateral distances (CD1, CD2, CD3) between the inclined sides at the given heights. An independent claim is also included for a structure for characterization of a tip of an atomic force microscope, comprising an element made of a material such as silicon or silicon-germanium, and another element made of another material such as silicon, silicon-germanium or silicon dioxide. |
