发明名称 |
MASK BLANK SUBSTRATE PROCESSING DEVICE, MASK BLANK SUBSTRATE PROCESSING METHOD, MASK BLANK SUBSTRATE FABRICATION METHOD, MASK BLANK FABRICATION METHOD, AND TRANSFER MASK FABRICATION METHOD |
摘要 |
Provided are a mask blank substrate processing device, a mask blank substrate processing method, a mask blank substrate fabrication method, a mask blank fabrication method, and a transfer mask fabrication method, for surface processing a mask blank substrate such that a high-level smoothness and a low-defect quality are satisfied. A mask blank substrate processing device (1) comprises: substrate support means (3) for supporting a substrate (Y); a catalytic surface plate (4) comprising a catalytic face (4a) which is positioned opposite the principal surface of the substrate (Y); relative movement means (5) for causing the catalytic face (4a) and the principal surface to move relative to each other in a state of being either in contact or in close proximity; first processing fluid supply means (6) which supplies a first processing fluid for CARE to the principal surface; and physical cleaning means (7) for removing foreign matter which has adhered to the principal surface from the principal surface, using a physical action. |
申请公布号 |
KR20150097484(A) |
申请公布日期 |
2015.08.26 |
申请号 |
KR20157014739 |
申请日期 |
2013.12.24 |
申请人 |
HOYA CORPORATION |
发明人 |
YAMADA TAKEYUKI;ORIHARA TOSHIHIKO;NISHIMURA TAKAHITO |
分类号 |
G03F1/60;C03C23/00;G03F1/24;G03F1/82;G03F7/20;H01L21/033 |
主分类号 |
G03F1/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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