发明名称 |
Microstructure with walls of determined optical property and method for making microstructures |
摘要 |
A microoptical device, and a method for forming cavities of the microoptical device, including: (a) forming, on the planar surface of a support substrate (10), a layer (12) of a sacrificial material, b) forming walls (6) of said cavities, the bottom of said cavities (4) being formed by said layer of sacrificial material, c) conformally depositing a layer (30) of absorbing, on tops (60) of the walls, on flanks (61, 62) of the walls, and on the bottom (4′) of the cavities, d) etching the sacrificial layer (12), and removing the material of this layer and the material of the layer (30) of absorbing material being present at the bottom of the cavities (4). |
申请公布号 |
US9116269(B2) |
申请公布日期 |
2015.08.25 |
申请号 |
US201113186940 |
申请日期 |
2011.07.20 |
申请人 |
Commissariat a l'energie atomique et aux energies alternatives |
发明人 |
Deschaseaux Edouard |
分类号 |
G02B27/00;G02B5/00;G02B1/10;G02F1/1333;G02F1/1335 |
主分类号 |
G02B27/00 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A method for forming cavities of a microoptical device, including:
a) forming, on a surface of a support substrate, a layer of a sacrificial material, b) forming walls of said cavities, a bottom of said cavities being formed by said layer of sacrificial material, c) conformally depositing a layer of optical material having a determined optical property, on tops of the walls, on flanks of the walls, and on the bottom of the cavities, said optical material being a porous material, d) etching the sacrificial layer, and removing the material of the sacrificial layer and the material of the portion of the layer of optical material being present at the bottom of the cavities, and (e) introducing one or more fluids into said cavities of the device to be in contact with the layer of optical material. |
地址 |
Paris FR |