Method of correcting flare and method of preparing extreme ultra violet mask

摘要

A method of correcting flare includes measuring flare of a test pattern, calculating point spread functions (PSFs) of the flare as a function of distance, and correcting the flare using corresponding PSFs for an influence range of the flare. The influence range is divided into a first range less than a predetermined distance and a second range equal to or greater than the predetermined distance, and corresponding PSFs are separately applied to the first and second ranges to correct the flare.

主权项

1. A method of correcting flare in extreme ultraviolet (EUV) lithography, the method comprising:
measuring flare of a test pattern; calculating point spread functions (PSFs) of the flare as a function of distance; and correcting the flare using the corresponding PSF for an influence range of the flare, wherein the influence range is divided into a first range less than a predetermined distance and a second range equal to or greater than the predetermined distance, and the predetermined distance corresponds to a distance between full-fields on which an exposure is performed, or a width of a scribe lane of a wafer.