发明名称 DEFECT EVALUATION METHOD AND DEFECT EVALUATION METHOD USING THE SAME DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a method and device for evaluating a crystal defect in a sample with higher sensitivity than a conventional manner by making the defect apparent about a sample having extremely small defect amount.SOLUTION: There is provided a method and device for evaluating a crystal defect in a sample with higher sensitivity than a conventional manner by making a defect apparent by emitting high energy electron beams in advance, and applying a cathode luminescence method.</p>
申请公布号 JP2015152546(A) 申请公布日期 2015.08.24
申请号 JP20140029136 申请日期 2014.02.19
申请人 TORAY RES CENTER:KK 发明人 INOUE KENSUKE;SUGIE RYUICHI
分类号 G01N21/66 主分类号 G01N21/66
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