| 摘要 |
PROBLEM TO BE SOLVED: To provide a block polymer that has good productivity and can form a self-organized thin film having a large dot pattern and to provide a method for producing the block polymer.SOLUTION: A block polymer includes as at least one kind of block chain constituting the molecule a block chain being a copolymerized product of an acrylic acid ester and a methacrylic acid ester and in addition to the block chain, includes a block chain composed of a polymerized product of styrene. In the block polymer, (1) the block polymer has a microphase-separated structure and the microphase-separated structure is a sea-island structure; (2) one or more kinds of block chains are synthesized by living radical polymerization; (3) the number average molecular weight is not less than 200,000 to not more than 1,000,000; (4) the molecular weight distribution is not more than 1.5; and (5) the dot remaining by plasma etching after annealing has an average diameter of not less than 100 nm. |
