发明名称 |
Measurement system of a light source in space |
摘要 |
A system measures the position of a light source in space using an imager and transparent surface with a pattern on top. The pattern consists of a repetitive pattern and a distinctive element. The system achieves sub-micron precision. It also handles the measurement of several light sources simultaneously, and the measurement of the position of a retroreflector instead of the light. |
申请公布号 |
US9103661(B2) |
申请公布日期 |
2015.08.11 |
申请号 |
US201113810455 |
申请日期 |
2011.07.14 |
申请人 |
CSEM CENTRE SUISSE D'ELECTRONIQUE ET DE MICROTECHNIQUE SA—RECHERCHE ET DEVELOPPMENT |
发明人 |
Grenet Eric;Masa Peter;Franzi Edoardo;Hasler David |
分类号 |
G01B11/14;G01C3/08;G01D5/34;G01D5/38;G01S1/70;G01S3/781;G01S3/783 |
主分类号 |
G01B11/14 |
代理机构 |
Young & Thompson |
代理人 |
Young & Thompson |
主权项 |
1. A measurement system comprising,
at least one imaging device composed of a plurality of sensitive pixels disposed in at least one dimension; at least one punctual light source; at least one component configured to cast a shadow on the imaging device, the position of the component being fixed with respect to the imaging device, the component being composed of repetitive patterns realized on a planar surface including a distinctive element, the component being configured to cast a shadow made of repetitive patterns and made of a distinctive element, the imaging device being configured to record an image of said shadow; and computation means; wherein the repetitive patterns are repeated at regular space intervals, and the computation means is configured to compute the elevation of the light source from the position of the distinctive element present in said image, and wherein the computation means is configured to modify the computed elevation of the light source from the position of the repetitive patterns present in said image. |
地址 |
Neuchatel CH |