发明名称 |
Method for the collision-free positioning of a micromanipulator tool |
摘要 |
A method for the collision-free positioning of a micromanipulation tool relative to a sample carrier with the aid of a microscope, comprising the following steps: a) determining the focal position Zp of at least one point P on the surface of the sample carrier by focusing a microscope objective with a first numerical aperture NA1 on the at least one point; b) positioning the micromanipulation tool on the optical axis of the microscope; c) determining the focal position ZM of the micromanipulation tool by focusing the microscope objective or a second microscope objective with a second numerical aperture NA2 smaller than the first numerical aperture NA1 onto the tip of the micromanipulation tool; d) calculating the lowering distance ZA(P) taking into account a predetermined tolerance profile ΔZ by the following equation:;ZA(P)=ZM−Zp−ΔZ where ΔZ=ΔZM+ΔZp, wherein ΔZM and/or ΔZp is a predetermined tolerance in the determination of the position of the manipulation tool and sample carrier, respectively; and e) positioning the micromanipulation tool at the point P by lowering by the lowering distance ZA(P). |
申请公布号 |
US9104200(B2) |
申请公布日期 |
2015.08.11 |
申请号 |
US201113641264 |
申请日期 |
2011.04.12 |
申请人 |
MMI AG |
发明人 |
Brill Norbert |
分类号 |
G05D3/00;G01N1/28;G02B21/32 |
主分类号 |
G05D3/00 |
代理机构 |
Pabst Patent Group LLP |
代理人 |
Pabst Patent Group LLP |
主权项 |
1. A method for the collision-free positioning of a micromanipulation tool relative to a sample carrier with the aid of a microscope, comprising the following steps:
a) determining the focal position Zp of at least one point P on the surface of the sample carrier by focusing a microscope objective with a first numerical aperture NA1 on the at least one point; b) positioning the micromanipulation tool on the optical axis of the microscope; c) determining the focal position ZM of the micromanipulation tool by focusing the microscope objective or a second microscope objective with a second numerical aperture NA2 smaller than the first numerical aperture NA1 onto the tip of the micromanipulation tool; d) calculating a lowering distance ZA(P) taking into account a predetermined tolerance profile ΔZ by the following equation:
ZA(P)=ZM−ZP−ΔZ where
ΔZ=ΔZM+ΔZP wherein ΔZM and ΔZp is a predetermined tolerance in the determination of the position of the manipulation tool and the sample carrier, respectively;
e) positioning the micromanipulation tool at the point P by lowering by the lowering distance ZA (P). |
地址 |
Glattbrugg CH |