| 发明名称 |
CONTINUOUS PROCESSING DEVICE |
| 摘要 |
To provide a processing device which is small but which can exhibits a sufficient processing amount and a uniform contact processing property. In the processing vessel 10, a liquid flow is set to a spiral flow, and in a contact processing field, the injection liquid A, B are injected at a center-side position with respect to an inner surface of the processing vessel so as to perform contact processing. |
| 申请公布号 |
US2015217264(A1) |
申请公布日期 |
2015.08.06 |
| 申请号 |
US201314423045 |
申请日期 |
2013.02.25 |
| 申请人 |
TSUKISHIMA KIKAI CO., LTD. |
发明人 |
Doya Yo;Goto Hidenori |
| 分类号 |
B01J19/24;B01J19/18 |
主分类号 |
B01J19/24 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A continuous processing device including: a processing vessel; an injecting unit for injecting an injection liquid into the processing vessel; and a circulating unit for extracting a processed liquid from another end portion of the processing vessel and returning at least a part of the extracted processed liquid to a one end portion of the processing vessel, the device comprising the processing vessel, in which a liquid flow is set to a spiral flow, and into which, the injection liquid is injected at a center-side position with respect to an inner surface thereof. |
| 地址 |
Tokyo JP |
