Method for making bowl shaped metal nanostructure array

摘要

A method for making bowl shaped metal nanostructure includes providing a metal layer located on a substrate. The metal layer has a top surface away from the substrate. A pattern mask layer is located on the top surface of the metal layer, wherein portion of the top surface of the metal layer is covered by the pattern mask layer. A plurality of flaws is formed in the pattern mask layer by annealing above substructure. After annealing, the substructure is etched by physical etching gas and reactive etching gas, to form the bowl shaped metal nanostructure.

主权项

1. A method for making a bowl shaped metal nanostructure array comprising:
providing a substrate; providing a metal layer on the substrate, wherein the metal layer has a top surface facing away from the substrate; applying a pattern mask layer on the top surface of the metal layer, wherein portion of the top surface of the metal layer is covered by the pattern mask layer; annealing and forming a plurality of flaws in the pattern mask layer; and etching above structure after annealing by physical etching gas and reactive etching gas.