发明名称 |
Method for curing structures using a dual photoinitiator system and a structure made using the same |
摘要 |
A monomeric formulation for fabrication of microlattice structures, the monomeric formulation including a plurality of monomers, a first photoinitiator configured to substantially activate above a wavelength of light, and a second photoinitiator configured not to substantially activate above the wavelength of light and to substantially activate below the wavelength of light. |
申请公布号 |
US9096722(B2) |
申请公布日期 |
2015.08.04 |
申请号 |
US201414255623 |
申请日期 |
2014.04.17 |
申请人 |
HRL Laboratories, LLC |
发明人 |
Yang Sophia S.;Jacobsen Alan J.;Hundley Jacob M.;Clough Eric C. |
分类号 |
C08F2/50;C08F2/46;A61L2/08;A61L24/00;C08G61/04;C08G75/14;C08F38/00;C08F16/12;C08F20/10;C08F20/54;C08F26/06;C08F36/02;C08G61/02 |
主分类号 |
C08F2/50 |
代理机构 |
Christie, Parker & Hale, LLP |
代理人 |
Christie, Parker & Hale, LLP |
主权项 |
1. A monomeric formulation for fabrication of microlattice structures, the monomeric formulation comprising:
a plurality of monomers comprising thiol; a first photoinitiator configured to substantially activate above a wavelength of light; and a second photoinitiator configured not to substantially activate above the wavelength of light and to substantially activate below the wavelength of light, wherein a concentration of the second photoinitiator in the monomeric formulation is greater than that of the first photoinitiator, the first photoinitiator being about 0.01% to about 0.1% by weight of the monomeric formulation, and the second photoinitiator being about 0.1% to about 1% by weight of the monomeric formulation. |
地址 |
Malibu CA US |