发明名称 IMAGE PROCESSING APPARATUS, DITHER MASK GENERATION METHOD AND PROGRAM
摘要 <p>PROBLEM TO BE SOLVED: To reduce resources required for a dither mask even when using the dither mask corresponding to a non-injecting nozzle, and to prevent a gradation from being reduced by dither processing even if the non-injecting nozzle is generated.SOLUTION: An image processing section includes: a storage part for storing a predetermined dither mask; a defective nozzle detection part for detecting a defective nozzle; and an interpolation processing part which identifies a mask position corresponding to a position of the detected defective mask from among mask positions included in the dither mask, and changes a threshold value of a predetermined mask position included in the dither mask so as to turn on a dot at the predetermined mask position in the case where a dot at the identified mask position is ON.</p>
申请公布号 JP2015142251(A) 申请公布日期 2015.08.03
申请号 JP20140014092 申请日期 2014.01.29
申请人 SEIKO EPSON CORP 发明人 HAYASHI TAKUMA
分类号 H04N1/405;B41J2/01;H04N1/403 主分类号 H04N1/405
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