发明名称 Microwave Processing Apparatus and Microwave Processing Method
摘要 A microwave processing apparatus for processing a substrate by irradiating a microwave to the substrate includes: a processing container configured to accommodate a substrate; and a microwave introducing device configured to have a microwave source that generates a microwave and introduce the microwave into a microwave radiation space within the processing container. The microwave introducing device includes: a waveguide configured to form a transmission path to guide the microwave into the processing container; a first microwave transmission window interposed between the transmission path and the microwave radiation space; and a second microwave transmission window installed to be closer to the microwave source than the first microwave transmission window, and configured to change a traveling direction of the microwave.
申请公布号 US2015206778(A1) 申请公布日期 2015.07.23
申请号 US201514591214 申请日期 2015.01.07
申请人 TOKYO ELECTRON LIMITED 发明人 SHIMOMURA Kouji
分类号 H01L21/67;H05B6/64;H01L21/324;H05B6/70 主分类号 H01L21/67
代理机构 代理人
主权项 1. A microwave processing apparatus for processing a substrate by irradiating a microwave to the substrate, comprising: a processing container configured to accommodate a substrate; and a microwave introducing device configured to have a microwave source that generates a microwave and introduce the microwave into a microwave radiation space within the processing container, wherein the microwave introducing device comprises: a waveguide configured to form a transmission path to guide the microwave into the processing container;a first microwave transmission window interposed between the transmission path and the microwave radiation space; anda second microwave transmission window installed to be closer to the microwave source than the first microwave transmission window, and configured to change a traveling direction of the microwave.
地址 Tokyo JP