发明名称 MEMS devices and methods for forming same
摘要 Embodiments of the present disclosure include MEMS devices and methods for forming MEMS devices. An embodiment is a method for forming a microelectromechanical system (MEMS) device, the method including forming a MEMS wafer having a first cavity, the first cavity having a first pressure, and bonding a carrier wafer to a first side of the MEMS wafer, the bonding forming a second cavity, the second cavity having a second pressure, the second pressure being greater than the first pressure. The method further includes bonding a cap wafer to a second side of the MEMS wafer, the second side being opposite the first side, the bonding forming a third cavity, the third cavity having a third pressure, the third pressure being greater than the first pressure and less than the second pressure.
申请公布号 US9085455(B2) 申请公布日期 2015.07.21
申请号 US201313893058 申请日期 2013.05.13
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Cheng Chun-Wen;Chu Chia-Hua
分类号 B81C3/00;B81B7/00 主分类号 B81C3/00
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A method for forming a microelectromechanical system (MEMS) device, the method comprising: forming a MEMS wafer having a first cavity; bonding a carrier wafer to a first side of the MEMS wafer, the bonding forming a second cavity, the second cavity having a second pressure, the second pressure being an ambient pressure; sealing the first cavity, wherein after the sealing the first cavity, the first cavity has a first pressure, the first pressure being less than the second pressure; and bonding a cap wafer to a second side of the MEMS wafer, the second side being opposite the first side, the bonding forming a third cavity, the third cavity having a third pressure, the third pressure being greater than the first pressure and less than the second pressure.
地址 Hsin-Chu TW