发明名称 |
MEMS devices and methods for forming same |
摘要 |
Embodiments of the present disclosure include MEMS devices and methods for forming MEMS devices. An embodiment is a method for forming a microelectromechanical system (MEMS) device, the method including forming a MEMS wafer having a first cavity, the first cavity having a first pressure, and bonding a carrier wafer to a first side of the MEMS wafer, the bonding forming a second cavity, the second cavity having a second pressure, the second pressure being greater than the first pressure. The method further includes bonding a cap wafer to a second side of the MEMS wafer, the second side being opposite the first side, the bonding forming a third cavity, the third cavity having a third pressure, the third pressure being greater than the first pressure and less than the second pressure. |
申请公布号 |
US9085455(B2) |
申请公布日期 |
2015.07.21 |
申请号 |
US201313893058 |
申请日期 |
2013.05.13 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Cheng Chun-Wen;Chu Chia-Hua |
分类号 |
B81C3/00;B81B7/00 |
主分类号 |
B81C3/00 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A method for forming a microelectromechanical system (MEMS) device, the method comprising:
forming a MEMS wafer having a first cavity; bonding a carrier wafer to a first side of the MEMS wafer, the bonding forming a second cavity, the second cavity having a second pressure, the second pressure being an ambient pressure; sealing the first cavity, wherein after the sealing the first cavity, the first cavity has a first pressure, the first pressure being less than the second pressure; and bonding a cap wafer to a second side of the MEMS wafer, the second side being opposite the first side, the bonding forming a third cavity, the third cavity having a third pressure, the third pressure being greater than the first pressure and less than the second pressure. |
地址 |
Hsin-Chu TW |