METHOD OF PRETREATING UNDERLAYER AND METHOD OF FABRICATING THIN FILM USING THE SAME

摘要

The present invention relates to a method for pre-treating an underlying layer and a method for fabricating a thin film using the same. The method for pre-treating an underlying layer includes: preparing a substrate with an underlying layer thereon; forming an organic silane compound layer on the underlying layer; and forming a silicon monolayer from the organic silane compound layer by performing an annealing process. The organic silane compound layer includes silicon and at least one material where a carbon atom and a hydrogen atom (C-H) are bonded.