DIFFUSION BONDED PLASMA RESISTED CHEMICAL VAPOR DEPOSITION (CVD) CHAMBER HEATER

摘要

Embodiments of the present invention generally relate to heated substrate supports having a protective coating thereon. The protective coating is formed from pure yttria or alloys predominantly of yttria. The protective coating is diffusion bonded to the heater plate of the substrate support. Two distinct silicon containing layers are formed between the heater plate and the protective coating as the result of the diffusion bonding.