| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern formation method capable of forming a pattern excellent in pattern remaining properties at the time of multiple development with excellent roughness performance, and a surface treatment agent, and a method for manufacturing an electronic device and an electronic device.SOLUTION: There is provided a pattern formation method including, in the order, (1) a process of forming an active ray-sensitive or radiation-sensitive film of a first active ray-sensitive or radiation-sensitive resin composition containing a resin which is decomposed by an acid to generate a polar group, (2) a process of exposing the first active ray-sensitive or radiation-sensitive film, (3) a process of developing the first active ray-sensitive or radiation-sensitive film by using an organic solvent-containing developing solution to obtain a first development pattern, (4) a process of making a surface treatment agent containing a compound interacting with a polar group which the exposed resin has act on the first development pattern, and (5) a process of further developing the first development pattern by using an alkali developing solution to obtain a second development pattern. There are also provided a surface treatment agent used therefor, and a method for manufacturing an electronic device and an electronic device. |
