| 摘要 |
<p>Provided is an apparatus for washing and treating a substrate. The apparatus for treating a substrate comprises: a returning unit supporting and returning the substrate; a washing unit having an upper brush member washing and treating an upper surface of the substrate supported from the returning unit; and a zero-point adjustment member guiding the height of the washing unit so that the cleaning unit is located on zero-point height. The upper brush member comprises: a roll shaft located at the top of the returning unit; a roll brush provided to cover an outer circumference surface of the roll shaft; and a shaft transfer member transferring the roll shaft up and down directions. The zero-point adjustment member comprises: a jig member attached and detached on one end of the roll shaft; and a zero-point member fixed and combined on the jig member to set the zero-point height. The zero-point adjustment member is transferred while holding the brush member so that the brush member is located on the zero-point height. Accordingly, the brush member may have a reference point.</p> |
