发明名称 |
Systems and methods for producing low work function electrodes |
摘要 |
According to an exemplary embodiment of the invention, systems and methods are provided for producing low work function electrodes. According to an exemplary embodiment, a method is provided for reducing a work function of an electrode. The method includes applying, to at least a portion of the electrode, a solution comprising a Lewis basic oligomer or polymer; and based at least in part on applying the solution, forming an ultra-thin layer on a surface of the electrode, wherein the ultra-thin layer reduces the work function associated with the electrode by greater than 0.5 eV. According to another exemplary embodiment of the invention, a device is provided. The device includes a semiconductor; at least one electrode disposed adjacent to the semiconductor and configured to transport electrons in or out of the semiconductor. |
申请公布号 |
US9076768(B2) |
申请公布日期 |
2015.07.07 |
申请号 |
US201214117965 |
申请日期 |
2012.05.16 |
申请人 |
GEORGIA TECH RESEARCH CORPORATION;THE TRUSTEES OF PRINCETON UNIVERSITY |
发明人 |
Kippelen Bernard;Fuentes-Hernandez Canek;Zhou Yinhua;Kahn Antoine;Meyer Jens;Shim Jae Won;Marder Seth R. |
分类号 |
H01L21/441;H01L51/00;H01L29/45;H01L51/52;H01B1/24;H01L51/50;H01L21/283;H01L51/10;H01L51/44 |
主分类号 |
H01L21/441 |
代理机构 |
Troutman Sanders LLP |
代理人 |
Troutman Sanders LLP ;Schnider Ryan A.;Jones Mark Lehi |
主权项 |
1. A method for reducing a work function of an electrode, the method comprising:
applying, to at least a portion of a conductive polymer electrode, a solution comprising a Lewis basic oligomer or polymer; and based at least in part on applying the solution, forming an ultra-thin layer on a surface of the electrode, wherein the ultra-thin layer reduces the work function associated with the electrode by greater than 1.0 eV, and wherein forming the ultra-thin layer comprises forming, on the electrode, an insulating layer having a thickness less than 50 nm. |
地址 |
Atlanta GA US |