| 摘要 |
<p>An abnormal discharge is suppressed in a chamber. A plasma processing apparatus (1) includes: a cylindrical chamber (10) which has an opening part (51) to input a substrate to be processed; a deposit shield (71) which is arranged along the inner wall of the chamber (10) and has an opening part (71a) in a position corresponding to the opening part (51); and a shutter (55) which is formed in a plate shape and opens or closes the opening part (71a). When the shutter (55) closes the opening part (71a), the outer circumference of the shutter (55) overlaps the deposit shield (71) in the thickness direction of the shutter (55). The inner circumference of the opening part (71a) overlaps the shutter (55) in the thickness direction of the shutter (55).</p> |
