| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid-state imaging device with high sensitivity.SOLUTION: A solid-state imaging device includes: a semiconductor substrate; a photodiode provided on a surface of the semiconductor substrate; a first insulating film formed on the surface of the semiconductor substrate and having a first refractive index; a second insulating film provided above the photodiode via the first insulating film and having a second refractive index higher than the first refractive index; a third insulating film provided on the second insulating film above the photodiode and having a third refractive index higher than the second refractive index; and a microlens provided above the photodiode. |
