发明名称 |
POLYMER FOR RESIST AND RESIST COMPOSITION COMPRISING THE SAME |
摘要 |
The present invention relates to a resist polymer and a resist composition including the same. The resist polymer has a carbamate acid inhibitor coupled to the central structure to increase the difference of the organic solvent solubility between an exposed area and an unexposed area without using a separate acid inhibitor. Accordingly, the present invention can form a fine pattern more effectively. |
申请公布号 |
KR20150075006(A) |
申请公布日期 |
2015.07.02 |
申请号 |
KR20140009375 |
申请日期 |
2014.01.27 |
申请人 |
KOREA KUMHO PETROCHEMICAL CO., LTD. |
发明人 |
HAN, JOON HEE;SHIN, JIN BONG;SHIN, BONG HA;CHOI, SU MI |
分类号 |
G03F7/004;G03F7/26;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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