发明名称 BLOCK COPOLYMER NANOSTRUCTURES FORMED BY DISTURBED SELF-ASSEMBLY AND USES THEREOF
摘要 Block copolymer nanostructures such as nanosheets, nanoribbons, and nanotubes, are provided. The nanotructures are formed by the self-assembly of block copolymers during evaporation of solvent from a sol that has been "disturbed", either i) internally by the introduction of relief (e.g. curvature) and/or the inclusion of nanoparticles in the sol; or ii) externally, e.g. by physical deformation of a semi-solid form of the sol, or a combination of internal and external disturbance. The nanostructures have uses in, for example, energy devices, electronics, sensors and drug delivery applications.
申请公布号 WO2015100126(A2) 申请公布日期 2015.07.02
申请号 WO2014US71140 申请日期 2014.12.18
申请人 WASHINGTON STATE UNIVERSITY 发明人 WANG, YU;ZHONG, WEI-HONG
分类号 B32B27/30 主分类号 B32B27/30
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